C-PAM Fall 2000 Seminar Series
September
8 Marlann Patterson, University of Wisconsin-Madison, Center for Plasma-Aided Manufacturing, Antenna Configurations for Large Area rf Inductive Plasma Sources
15 Yansheng Men, University of Wisconsin-Madison, Center for Plasma-Aided Manufacturing, The CFx Radical and Etch Product Concentrations in Fluorocarbon Plasmas from Tunable Infrared Diode Laser Spectroscopy
22* William Lenling, Thermal Spray Technologies, Surface Coating Using Thermal Spray Process
29 Dr. Bon-Woong Koo, Varian Semiconductor Equipment Associates, Plasma Characterization of a Plasma Doping System for Semiconductor Device Fabrication
October
13* Erik Wilson, University of Wisconsin-Madison, Center for Plasma-Aided Manufacturing, Plasma Source Ion Implantation Technology for Engineering Surfaces of Materials
20* Dr. John Woodford, Argonne National Laboratory, Ultra Low Friction Diamond-like Carbon Films Research at Argonne National Laboratory
November
3 Matt Blain, Sandia National Laboratories, Design, Fabrication, and Operation of a High-Resolution Submicron Retarding Field Energy Analyzer for Process Plasma Analysis
10 Barbara Abraham-Shrauner, Washington University-St. Louis, Etching, Sidewall Passivation, and Microtrenching in Contact holes and Edge Regions
14 Deepak Gupta, CPAT, Institute for Plasma-Research-India, Effects of Dust Particles on Electrical Corona Discharge
17 Darrin Leonhardt, Plasma Physics Division, U.S. Naval Research Laboratory, Large Area Plasma Processing System Based on Electron Beam Ionization
December
8 Lawrence Overzet, Plasma Application Laboratory, University of Texas-Dallas, An Inductively Coupled Plasma Source: Design and Characterization
The Seminar Series is available on videotape and a complete listing is available at our website (http://cpam.engr.wisc.edu/). For information, please contact the C-PAM office at (608) 263-4970.
January
26 Prof. Karen Gleason, Dept. of Chemical Engineering, MIT, Pulsing or Eliminating the Plasma Enhancement of Chemically Vapor Deposited Organic Thin Films
February
2 G.D. Severn, Dept. of Physics, University of San Diego, Diode Lasers for Laser-Induced Fluorescence Diagnosis of Distribution Functions and Transport Coefficients in ArII Plasmas
9 Silvia Alvarez-Blanco, University of Wisconsin-Madison, Center for Plasma-Aided Manufacturing, Thin Polyaniline Layers Produced by Horseradish Peroxidase Immobilized on RF-Plasma Functionalized Polyethylene Surfaces
16 Hyuk Yu, University of Wisconsin-Madison, Dept. of Chemistry, Plasma-Aided Surace Modification of Commodity Polymers for Biocompatibility
23 Jeff Hopwood, Northeastern University, ECE Dept., Plasma-on-a-chip: Microfabricated Plasma Generators
March
9* Kumar Sridharan, University of Wisconsin-Madison, Center for Plasma-Aided Manufacturing, Dept. of Engineering Physics, Surface Engineering of Materials by Plasma-based Ion Implantation & Film Deposition
23 Shahid Rauf, Motorola Semiconductor Products Sector, Modeling of the Bosch Deep Si Etch Process
30 John Curry, University of Wisconsin-Madison, Physics Dept., High Intensity Discharge Lamps and X-ray Diagnostics: Probing Low-temperature Plasmas with High Energy Photons
April
20 Joseph Cecchi, University of New Mexico, Time-Resolved Fluorocarbon Radical Concentrations and Temperatures During Pulsed Oxide Etching Plasmas
27 Dr. Alexander Piel, Christian-Albrechts University, Kiel, Germany, Institute for Experimental and Applied Physics, Waves and Oscillations in Dusty Plasmas
May
4 Carolyn Aita, University of Wisconsin-Milwaukee, Advanced Coatings Experimental Laboratory, Nanostructured Ceramics for Multifunctional Coatings
The Seminar Series is available on videotape and a complete listing is available at our website (http://cpam.engr.wisc.edu/). For information, please contact the C-PAM office at (608) 263-4970.